Functionalized Micromechanical Resonators with High Quality Factors
نویسندگان
چکیده
The dissipation of mechanical energy in 250-nm-thick, MHz-range silicon resonators is found to be strongly dependent on the chemical nature of the surface. As a result, sub-monolayer changes in the termination of 250-nm-thick resonators lead to significant changes in quality (Q) factor. The chemical origins of this effect are under investigation. Strategies for the formation of arbitrarily functionalized, high-Q resonators have been demonstrated.
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